41![](https://www.pdfsearch.io/img/9c6c09b95456ad6c2aa576fa85d73509.jpg) | Add to Reading ListSource URL: s3.mentor.com.s3.amazonaws.comLanguage: English - Date: 2012-06-14 13:53:12
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42![White Paper Accelerating 20nm Double Patterning Verification with IC Validator Author White Paper Accelerating 20nm Double Patterning Verification with IC Validator Author](https://www.pdfsearch.io/img/07f652cea169ae7351710c4fd27feefe.jpg) | Add to Reading ListSource URL: www.synopsys.comLanguage: English - Date: 2014-11-07 14:30:19
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43![1 Single-Mask Double-Patterning Lithography for Reduced Cost and Improved Overlay Control Rani S. Ghaida, George Torres, and Puneet Gupta EE Dept., University of California, Los Angeles 1 Single-Mask Double-Patterning Lithography for Reduced Cost and Improved Overlay Control Rani S. Ghaida, George Torres, and Puneet Gupta EE Dept., University of California, Los Angeles](https://www.pdfsearch.io/img/3a1944643411c784abc1245b00b38182.jpg) | Add to Reading ListSource URL: nanocad.ee.ucla.eduLanguage: English - Date: 2010-07-29 18:01:55
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44![Sagantec’s nmigrate adopted and deployed for 14nm technology Major semiconductor company successfully migrated 28nm libraries to 14nm FinFET Santa Clara, California - May 29, [removed]Sagantec announced that its nmigrate Sagantec’s nmigrate adopted and deployed for 14nm technology Major semiconductor company successfully migrated 28nm libraries to 14nm FinFET Santa Clara, California - May 29, [removed]Sagantec announced that its nmigrate](https://www.pdfsearch.io/img/8468a0776b6a22ed5df9684696f24aa0.jpg) | Add to Reading ListSource URL: www.sagantec.comLanguage: English - Date: 2014-06-17 16:10:10
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45![Sagantec announces nmigrate™ Migration and DRC correction tool for advanced nanometer technologies SANTA CLARA, California – May 14, 2012 – Sagantec announced today its nmigrate layout migration and optimization to Sagantec announces nmigrate™ Migration and DRC correction tool for advanced nanometer technologies SANTA CLARA, California – May 14, 2012 – Sagantec announced today its nmigrate layout migration and optimization to](https://www.pdfsearch.io/img/10fc69165e3503d56d46488722a1586f.jpg) | Add to Reading ListSource URL: www.sagantec.comLanguage: English - Date: 2014-06-17 16:11:45
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46![Sagantec Demos and Presentations Featuring the following presentations and demos: • • • • Sagantec Demos and Presentations Featuring the following presentations and demos: • • • •](https://www.pdfsearch.io/img/4d2e15fb3405d25198ef4db8344860d2.jpg) | Add to Reading ListSource URL: www.sagantec.comLanguage: English - Date: 2014-06-17 16:09:36
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47![Charting CEBL’s Role in Mainstream Semiconductor Lithography David K. Lam Multibeam Corporation, 4008 Burton Drive, Santa Clara, CA, USA 95054* ABSTRACT E-Beam direct writing (EBDW) requires no masks and affords high r Charting CEBL’s Role in Mainstream Semiconductor Lithography David K. Lam Multibeam Corporation, 4008 Burton Drive, Santa Clara, CA, USA 95054* ABSTRACT E-Beam direct writing (EBDW) requires no masks and affords high r](https://www.pdfsearch.io/img/3a35534769b5b98e1bff9c2d42f7c49f.jpg) | Add to Reading ListSource URL: www.multibeamcorp.comLanguage: English - Date: 2014-06-26 13:06:22
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48![Executive Briefing: Getting Direct On Litho Posted on: October 17th, [removed]Posted by : Mark LaPedus One-on-one with David Lam about next-generation lithography, where he’s placing his bets, and what’s changing in th Executive Briefing: Getting Direct On Litho Posted on: October 17th, [removed]Posted by : Mark LaPedus One-on-one with David Lam about next-generation lithography, where he’s placing his bets, and what’s changing in th](https://www.pdfsearch.io/img/560c6b084dae8055b9442c95f3325acf.jpg) | Add to Reading ListSource URL: www.multibeamcorp.comLanguage: English - Date: 2014-06-26 13:05:59
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49![List of Leading EUVL Technical Challenges 2014 International Workshop on EUVL Makena Beach, Maui, Hawaii, June 23-37, 2014 Source Power scaling of Sn LPP sources to 250 W List of Leading EUVL Technical Challenges 2014 International Workshop on EUVL Makena Beach, Maui, Hawaii, June 23-37, 2014 Source Power scaling of Sn LPP sources to 250 W](https://www.pdfsearch.io/img/0f96837b04923d6b607e6281315b4a90.jpg) | Add to Reading ListSource URL: www.euvlitho.comLanguage: English - Date: 2014-02-06 23:29:18
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50![2014 International Workshop on EUV Lithography Makena Beach & Golf Resort, Maui, Hawaii June 23-27, 2014 FIRST CALL FOR PAPERS We are inviting presentations and poster papers for the 2014 International Workshop on EUV Li 2014 International Workshop on EUV Lithography Makena Beach & Golf Resort, Maui, Hawaii June 23-27, 2014 FIRST CALL FOR PAPERS We are inviting presentations and poster papers for the 2014 International Workshop on EUV Li](https://www.pdfsearch.io/img/936a2fa9fb1f7be1dbdcfbcad2c53fbe.jpg) | Add to Reading ListSource URL: www.euvlitho.comLanguage: English - Date: 2014-03-07 16:40:53
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